Ellipsometry is a surface sensitive, non-destructive, and non-intrusive optical metrology technique widely used to determine thin film thickness and optical constants (n, k). Ellipsometry is ideal for a wide range of thin film applications from fields such as semiconductors, solar, optoelectronics, optical and functional coatings, surface chemistry, and biotechnology. For more information on thin film characterisation and analysis using spectroscopic ellipsometry, please visit the Horiba Scientific Ellipsometry Academy, which provides a tutorial, webinars and videos, and some FAQ’s to help you with your thin film analysis.
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